Research Scientist | KLA-Tencor

Date Posted: 
Thursday, September 1, 2016

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Job Description: 

Business Unit: 5D

Business Unit Description

With over 38 years of semiconductor process control experience, chipmakers around the globe rely on KLA-Tencor to ensure that their fabs ramp next-generation devices to volume production quickly and cost-effectively. Enabling the movement towards advanced chip design, KLA-Tencor's Patterning Solutions Group (PSG) is looking for the best and the brightest research scientist, software engineers, application development engineers, and senior product technology process engineers to join our 5D team.

Our 5D patterning process control technologies control the three dimensions of the device structure, while optimizing the process control loops (time) and minimizing the expense (cost) to create the device; hence five dimensional patterning process control (5D).

The team's mission is to collaborate with our customers to innovate hardware and software technologies that detect and control process variations—at their source—rather than compensate for them at later stages of the manufacturing process. These patterning process control solutions provide the most accurate process correctables available today; providing real-time feedback and feed-forward control to improve subsequent process steps.

Why join 5D? Think of this team as a "start-up" company where you are offered the ultimate challenge to solve the most complex technical problems that enable the digital age. Yet, this "start-up" is backed by the most sophisticated and successful process control company in the semiconductor industry.

Responsibilities

KLA-Tencor has an opening for a research scientist in our Patterning Division working on metrology target design. Target design is much more complicated due to sophisticated resolution enhancement techniques (RET) and multiple patterning schemes required in leading-edge semiconductor manufacturing processing.  Lithography imaging with RET greatly enhances process robustness (such as depth of focus) for a specific set of layout geometries or design rules.  Metrology targets must be designed so that they conform to these rules.  Multiple patterning also creates challenges because the geometry of the target on the wafer can be very different from the originally printed lithography structures.  The researcher in this role will work with customers to design targets that are design rule compatible, process integration aware, and also are measureable on KLA-Tencor tools such as the Archer overlay tool.

Preferred Qualifications

  • The candidate should be familiar with Fourier Optics, optical imaging, computational imaging, and Diffraction & Interference theory. 
  • The candidate should have strong knowledge of OPC and standard RET as well as multi-patterning schemes used in leading-edge semiconductor manufacturing.
  • Candidate should also be familiar with metrology tools such as overlay and optical CD (scatterometry).

Job ID: 113945