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For research at the University of Arizona, we are currently accepting projects involving UV photo-sensitive materials for feature sizes down to 10 mm.

 

 

 

 




Facilities
 

The bulk of our recent efforts has been the development of a High-Speed Maskless Grayscale Lithography (HSMGL) phototool for UV exposure of photosensitive materials, such as photoresist and solgels. 

The Laboratory for Diffractive and Microoptics also includes (but is not limited to) a variety of other equipment and facilities....

Access to a Class 100 Cleanroom
Scanning Electron Microscope 
White Light Interferometer
Wet bench and spinner

The OSC Maskless Lithography Tool is specifically modified to pattern grayscale images from JPEG, BMP or other common digital image formats. The phototool is capable of high speed imaging… a 12k x 12k image over a 25mm x 25mm area is imaged in less than 15 seconds.

HSMGL

We have recently upgraded our electronics to provide the ability to pattern 1-2.5 micron pixels with 10-bit of electronic grayscale control.

We are looking for further applications to validate our tool.  Please contact us if you think your research could benefit from its use.

 

 

 

SEM

 

 

 

 

 

 

 

 

For more background on the HSMGL, download the documents below..