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 While conventional
micro-optics are fabricated using traditional semiconductor lithography
(i.e., photomask exposure, development, and pattern
transfer) we are committed to investigating alternative,
potentially lower-cost, methods:
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Significant research is on-going
within Dr. Descour’s group using grayscale photomask
exposure of solgel materials (requiring no pattern transfer). |
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We are also developing a high-speed, maskless, grayscale lithography tool.
Removing the photomask from the process allows us to do two
things:
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(1). Rapidly prototype new devices
(2). Compensate for nonlinear imaging, development, or transfer
processes.
Click on the tabs to the left to
learn more about both of these efforts.
Links to
projects* that utilize the Laboratory's resources are listed below...
We are actively pursuing both academic and
corporate research partners....please click the "Contact" tab above
to learn more.
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Fresnel Zone Plate
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