Colloquium: Bernd Geh

    Date: 
    Thursday, February 23, 2017 - 3:30pm - 5:00pm
    Location: 
    Meinel 307
    Description: 

    EUV Technology for the semiconductor industry

    Abstract(s): 

    The Chip industry is still pursuing Moore’s law to build devices with smaller transistors and less power consumption to provide integrated circuits for a quickly growing landscape of applications. The lenses needed to provide the resolution and aberration levels required by the Chip industry have by far (2-3 orders of magnitude) surpassed the perfection levels of even the best camera lenses.After a brief introduction of the Company Carl Zeiss, the presenter will give an introductory overview of logic and memory device roadmaps. As Optical Micro Lithography is and will remain an important technology in chip manufacturing, the main portion of the presentation will focus the technological challenges and solutions of the new EUV Technology (using 13.5nm exposure wavelength) which will be a key technology for chipmakers in the upcoming years.

    Speaker Bio(s): 

    Bernd Geh is a Senior Principle Scientist at Carl Zeiss SMT. He received his masters degree in physics (Dipl. Phys.) from the University of Munich (1987). In 1988 he joined Carl Zeiss. He worked at Zeiss corporate research and in the interferometry division until he joined the Metrology Department of the Zeiss Semiconductor Optics Division in 1995. Since 2001 Bernd is a permanent Carl Zeiss assignee at the Technology Development Center at ASML in Chandler, AZ. He was elected SPIE Fellow in 2015.